1、磁控溅射的原理是基于阴极辉光放电理论,把阴极表面磁场扩展到接近工作表面,提高了溅射原子离化率。既保留磁控溅射的细腻又增强了表面光泽度。
2、电弧等离子体蒸发源性能可靠,在优化阴极及磁场结构镀膜时可在30A电流下工作,镀膜膜层和基底界面产生原子扩散,又具有离子束辅助沉积的特点。
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1、磁控溅射的原理是基于阴极辉光放电理论,把阴极表面磁场扩展到接近工作表面,提高了溅射原子离化率。既保留磁控溅射的细腻又增强了表面光泽度。
2、电弧等离子体蒸发源性能可靠,在优化阴极及磁场结构镀膜时可在30A电流下工作,镀膜膜层和基底界面产生原子扩散,又具有离子束辅助沉积的特点。
WWW.HCVAC.COM
WWW.SUICHENGGD.CN
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